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The photochemical removal of acrolein (C_2H_3CHO) was investigated in air (O_2 5-20%) at atmospheric pressure using a head-on type of 172-nm Xe_2 excimer lamp. When 172-nm light was irradiated to C_2H..._3CHO, HCHO, HCOOH, CO, CO_2, and O_3 were observed in FTIR spectra. The dependence of product concentrations on the irradiation time indicated that C_2H_3CHO is converted to CO_2 via HCHO, HCOOH, and CO intermediates. The initial removal rates of C_2H_3CHO increased from 0.80 to 1.43 min^-1 with decreasing the O_2 concentration from 20 to 5%. Besides direct photolysis of C_2H_3CHO, O(^3P), O(^1D), and O_3 are possible active species of C_2H_3CHO removal. The contribution of O(^1D) was examined from the total pressure dependence of the residual amount of C_2H_3CHO, and that of O_3 was obtained from the O_3 + C_2H_3CHO reaction in the same apparatus. It was inferred that C_2H_3CHO is initially decomposed by direct vacuum ultraviolet (VUV) photolysis of C_2H_3CHO and the O(^3P) + C_2H_3CHO reaction. It was oxidized further by reactions of H, O(^3P,^1D), OH, and O_3 with various intermediates such as HCHO, HCOOH, and CO, leading to CO_2 as a final product.続きを見る
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Mendeley出力
4701_p017.pdf