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<図書>
Surface analysis and interactions

責任表示 edited by Orlando Auciello, Daniel L. Flamm
シリーズ Plasma-materials interactions ; . Plasma diagnostics ; v. 2
データ種別 図書
出版者 Boston ; Tokyo : Academic Press
出版年 c1989
本文言語 英語
大きさ x, 337 p. : ill. ; 24 cm
概要 Plasmas and their interaction with materials have become subjects of major interest because of their importance in modern forefront technologies such as microelectronics, fusion energy, and space. Pla...mas are used in microelectronics to process semiconductors (etching of patterns for microcircuits, plasma-induced deposition of thin films, etc.); plasmas produce deleterious erosion effects on surfaces of materials used for fusion devices and spaceships exposed to the low earth environment. Diagnostics of plasmas and materials exposed to them are fundamental to the understanding of the physical and chemical phenomena involved. Plasma Diagnostics provides a comprehensive treatment of the subject. short version, TJE_ Plasmas and their interaction with materials have become subjects of major interest because of their importance in modern forefront technologies such as microelectronics, fusion energy, and space. Diagnostics of plasmas and materials exposed to them are fundamental to the understanding of the physical and chemical phenomena involved. Plasma Diagnostics provides a comprehensive treatment of the subject. 続きを見る
目次 v. 1. Discharge parameters and chemistry
v. 2. Surface analysis and interactions.

所蔵情報


理系図1F 開架 068252189005666 427.6/A 96/(2) 1989

筑紫図 067212000004948 428.41/A 96 1989

書誌詳細

一般注記 Includes bibliographies and index
著者標目 Auciello, Orlando, 1945-
Flamm, Daniel L.
件 名 LCSH:Plasma diagnostics
分 類 DC19:530.4/1
LCC:QC718.5.D5P54
NDC7:428.41
NDC7:428.7
書誌ID 1000929820
ISBN 0120676362
NCID BA0693230X
巻冊次 ISBN:0120676362
登録日 2009.09.16
更新日 2011.11.17

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