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＜conference paper＞
Negative Bias Effects on Mechanical Properties of Ultrananocrystalline Diamond on Cemented Carbide Substrate Prepared by Coaxial Arc Plasma Deposition

Creator
Creator Name
Ali, Ali M.
Affiliation
Affiliation Name
Dept. of Applied Science for Electronics and Materials, Kyushu University | Dept. of Physics, Al-Azhar University
Creator Name
Egiza, Mohamed
Affiliation
Affiliation Name
Dept. of Applied Science for Electronics and Materials, Kyushu University | Dept. of Mechanical Engineering, Kafrelsheikh University
Creator Name
Murasawa, Koki
Affiliation
Affiliation Name
OSG Corp.
Creator Name
Fukui, Yasuo
Affiliation
Affiliation Name
OSG Corp.
Creator Name
Gonda, Hidenobu
Affiliation
Affiliation Name
OSG Corp.
Creator Name
Sakurai, Masatoshi
Affiliation
Affiliation Name
OSG Corp.
Author PID
K001363
Creator Name
Yoshitake, Tsuyoshi
吉武, 剛
ヨシタケ, ツヨシ
Affiliation
Affiliation Name
Dept. of Applied Science for Electronics and Materials, Kyushu University
Language
English
Publisher
Interdisciplinary Graduate School of Engineering Sciences, Kyushu University
九州大学大学院総合理工学府
Date
2018-10-18
Source Title
Proceedings of International Exchange and Innovation Conference on Engineering & Sciences (IEICES)
Vol
4
First Page
88
Last Page
89
Conference
Name
International Exchange and Innovation Conference on Engineering & Science(IEICES)
Sequence
4
Place
Kyushu University
九州大学
Country
Japan
Publication Type
Version of Record
Access Rights
open access
JaLC DOI
https://doi.org/10.15017/1961292
Abstract Ultrananocrystalline diamond (UNCD)/amorphous carbon (a-C) composite (UNCD/a-C) films were deposited on cemented carbide (WC-Co) substrates, which were pulsed-biased at a voltage of 100, -500 volt, by... coaxial arc plasma deposition. The film were deposited at a thickness of 9 μm, which is more than an order of magnitude more than that of comparably hard diamond like carbon films deposited by arc ion plating deposition and three time thicker than the UNCD/a-C film deposited without negative bias voltage. In addition, the deposition rate evidently increased under the negative bias. This might be because the negative bias voltage enhances the attraction of positively charged carbon species from the plasma to the substrates, which results in enhanced film adhesion on the substrates and the release of film internal stresses. In this work, effects of negative bias voltage on the mechanical properties of UNCD/a-C films prepared by CAPD, for the first time, were investigated.show more

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Details

EISSN
2434-1436
Record ID
1961292
Subject Terms
Ultrananocrystalline diamond
hard coating
coaxial arc plasma
negative bias
Created Date 2018.11.28
Modified Date 2019.03.18

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