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Mo/Si multilayer mirrors are used for extreme ultraviolet (EUV) lithography. The formation of hydrogen-induced blister in the Mo/Si multilayer is a problem that reduces the reflectance of the mirror. ...In this study, the blister-resistance of Mo/Si multilayer mirror samples with multiple materials of intermediate layers as thin as 1 nm between the capping layer and the multilayer was investigated using a high-frequency hydrogen plasma system as a hydrogen ion source. As a result, it was observed that the intermediate layer suppressed the blister formation. Furthermore, intermediate layer materials that can suppress blister formation and materials that cannot suppress blister formation were observed, and investigation has shown that the blister-resistance is greatly affected by the properties of the multilayer interface.続きを見る
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