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Ultrananocrystalline diamond (UNCD)/amorphous carbon (a-C) composite (UNCD/a-C) films were deposited on cemented carbide (WC-Co) substrates, which were pulsed-biased at a voltage of 100, -500 volt, by... coaxial arc plasma deposition. The film were deposited at a thickness of 9 μm, which is more than an order of magnitude more than that of comparably hard diamond like carbon films deposited by arc ion plating deposition and three time thicker than the UNCD/a-C film deposited without negative bias voltage. In addition, the deposition rate evidently increased under the negative bias. This might be because the negative bias voltage enhances the attraction of positively charged carbon species from the plasma to the substrates, which results in enhanced film adhesion on the substrates and the release of film internal stresses. In this work, effects of negative bias voltage on the mechanical properties of UNCD/a-C films prepared by CAPD, for the first time, were investigated.続きを見る
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