作成者 |
|
|
本文言語 |
|
出版者 |
|
|
発行日 |
|
収録物名 |
|
巻 |
|
号 |
|
開始ページ |
|
終了ページ |
|
出版タイプ |
|
アクセス権 |
|
JaLC DOI |
|
関連DOI |
|
|
|
|
関連URI |
|
|
|
|
関連情報 |
|
|
|
|
概要 |
The effect of the electron thermal motion on inductively coupled plasma (ICP) production by the use of a planar, spiral antenna was investigated experimentally. Results were compared to the calculated... ones by the non-local model based on the electron motion. Both of the measured skin depth of the evanescent wave and antenna-plasma loading resistance suggested a collisionless (collisional) heating mechanism in the low (high) collisionality for the ICP production. In addition, changing the boundary condition, Ar filling pressure and radio frequency (RF),the measured wave amplitude and the phase showed that the electron thermal motion plays more important role under the low collisionality.続きを見る
|