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We have examined an Inductively coupled plasma (ICP) production mechanism for the different types of the antenna by means of a Langmuir probe method, an electrical measurement of an antenna and an ind...uction field measurement. We could find that the plasma production depends on the antenna geometry. Especially the important factors are given in the following, the capacitance between the antenna and the plasma, the phase angle of the induction field for the antenna voltage and the induction field penetration into the plasma. These factors arise from the heated electron loss at the quartz window. It is proved that the plasma production efficiency rises due to the magnetic field to control the electron loss.続きを見る
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Mendeley出力
