<紀要論文>
非線型の表面反応を示す系に対するカバレッジのシミュレーション

作成者
本文言語
出版者
発行日
雑誌名
開始ページ
終了ページ
出版タイプ
アクセス権
JaLC DOI
概要 Step coverage simulation code was newly developed. This code, which is a kind of test particle Monte Carlo method, can simulate the step coverage with non-liner surface reaction, for example Tungsten ...(W) thermal Chemical Vapor Deposition (CVD) using hydrogen (H_2) and hexafluoro Tungsten (WF_6). The availability of this code was examined by the comparison of the experimental obtained step coverage and simulated one through W-CVD. The simulation results well explained the WF_6 concentration dependency of step coverage of W film grown on the silicon substrate. The step coverage of film grown at 773K and in low WF_6 concentration becomes poor coverage, however the film grown in high WF_6 concentration shows good coverage. Under high WF_6 concentration, the growth rate reaches the ceiling, namely the growth rate have the same value on the any position in the trench, and consequently the step coverage became good.続きを見る

本文情報を非表示

KJ00004507862 pdf 509 KB 248  

詳細

レコードID
査読有無
関連情報
ISSN
NCID
タイプ
登録日 2009.04.22
更新日 2017.06.07