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＜Doctoral Thesis＞
Deposition Mechanism and Characterization of a-C:H Films Deposited using Ar + H2 + C7H8 Plasma CVD
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3.88 MB | 194 | 本文 | |
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isee0583_abstract
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102 KB | 129 | 要旨 | |
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isee0583_review
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104 KB | 137 | 審査結果要旨 |
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| Created Date | 2016.05.10 |
| Modified Date | 2020.10.09 |