<学術雑誌論文>
Probing Crystal Dislocations in a Micrometer-Thick GaN Film by Modern High-Voltage Electron Microscopy

作成者
本文言語
出版者
発行日
収録物名
開始ページ
終了ページ
出版タイプ
アクセス権
権利関係
関連DOI
関連URI
関連HDL
概要 We report on extreme penetration power of relativistic electrons in a micrometer-thick gallium nitride epitaxial film and its application to probing threading dislocations, which were introduced durin...g crystal growth. Maximum usable thickness of the specimen was quantitatively evaluated using high-voltage transmission electron microscopy (TEM) operating at 1 MV. The width of dislocation images was used as a measure for the evaluation of usable thickness. Superior maximum usable thickness was obtained in scanning transmission electron microscopy (STEM) than in TEM mode; the results were 6.9 μm for STEM and 4.4 μm for TEM. In STEM, dislocations can be imaged with an almost constant width of 15–20 nm in a wide thickness range 1–4 μm. The latest high-voltage STEM is thus useful for observing dislocations in micrometer-thick inorganic materials.続きを見る

本文ファイル

pdf 7393038 pdf 9.52 MB 3  

詳細

EISSN
レコードID
関連PubMed ID
主題
タイプ
助成情報
登録日 2025.11.23
更新日 2025.11.28