| 作成者 |
|
|
|
|
|
| 本文言語 |
|
| 出版者 |
|
| 発行日 |
|
| 収録物名 |
|
| 巻 |
|
| 開始ページ |
|
| 出版タイプ |
|
| アクセス権 |
|
| 権利関係 |
|
| 権利関係 |
|
| 関連DOI |
|
|
|
| 関連URI |
|
|
|
| 関連HDL |
|
|
|
| 概要 |
An experimental method has been demonstrated to evaluate dislocations in 4H-SiC crystals that affect the performance of industrially important power devices. Using high-voltage electron microscopy wit...h 1 MeV electrons, it is possible to visualize dislocations contained in a 5 μm-thick crystal with a spatial resolution of ∼ 10 nm. This method has a 10∧3 times better spatial resolution than currently existing characterization methods for crystalline defects in semiconductor wafers. Scanning transmission electron microscopy (STEM) is suitable for imaging thick specimens than transmission electron microscopy (TEM) in respect of image blurring due to chromatic aberration caused by inelastic scattering of electrons with increasing specimen thickness. With the proposed method, the maximum observable specimen thickness was determined to be 8.6 μm for STEM and 5.4 μm for TEM.続きを見る
|