作成者 |
|
|
|
|
|
本文言語 |
|
出版者 |
|
|
発行日 |
|
収録物名 |
|
巻 |
|
号 |
|
開始ページ |
|
終了ページ |
|
出版タイプ |
|
アクセス権 |
|
JaLC DOI |
|
関連DOI |
|
|
|
関連URI |
|
|
|
関連情報 |
|
|
|
概要 |
Since 2002, we have been researching and developing a method for generation EUV light by irradiating a tin droplet with a laser beam. We believe the double pulse lasers irradiation scheme, in which th...e droplet is irradiated with a pre-pulse laser beam and a pulse CO_2 laser beam, and the debris mitigation by magnetic field are keys for industrial EUV light source system. In our experimental tool, we have investigated and optimized the droplet behavior and observed effect of the double pulse lasers irradiation scheme. The double-pulse method can improve conversion efficiency by 3.7% by increasing ionization rate of the droplet (93%). The pulse CO_2 laser energy absorption rate into the droplet is 68% at optimized pre-pulse laser setting. Also the 98% of ions were captured by our mitigation technique. Our scheme is also tested on the proto type of the industrial system. No ion signal was observed by Faraday cup on the collector mirror. It is expected our scheme will achieve high power and long time operation in industrial use.続きを見る
|