Two Dimensional PIC Simulation of VHF Capacitively Coupled Ar Plaasma - Collections | Kyushu University Library

＜departmental bulletin paper＞
Two Dimensional PIC Simulation of VHF Capacitively Coupled Ar Plaasma

Creator	Creator Name Su, Li-Wen Affiliation Affiliation Name Department of Applied Science for Electronics and Materials, Kyushu University : Graduate Student
	Author PID K001477 Creator Name Uchino, Kiichiro 内野, 喜一郎ウチノ, キイチロウ Affiliation Affiliation Name Department of Electrical and Material Science, Kyushu University : Professor 九州大学大学院総合理工学研究院エネルギー科学部門電気理工学講座 : 教授
	Author PID 10038565 Creator Name Kawai, Yoshinobu 河合, 良信カワイ, ヨシノブ Affiliation Affiliation Name Kyushu University : Professor Emeritus 九州大学 : 名誉教授
Language	English
Publisher	九州大学大学院総合理工学府
Publisher	Interdisciplinary Graduate School of Engineering Sciences, Kyushu University
Date	2019-02
Source Title	Engineering sciences reports, Kyushu University
Vol	40
Issue	2
First Page	1
Last Page	5
Publication Type	Version of Record
Access Rights	open access
JaLC DOI	https://doi.org/10.15017/2544155
Abstract	A very high frequency capacitively coupled plasma source (100 MHz) was studied using a two-dimensional PIC simulation, and spatial distributions of the plasma parameters were examined at a discharge g...ap of 25 mm. In the simulation, electromagnetic effects were not taken into account. Electron energy distribution functions were also calculated. It was found that the density and temperature of electrons had a peak value at the center and near the edge of the discharge electrodes, while the plasma potential was fairly uniform.show more

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Record ID	2544155
Subject Terms	Capacitively coupled plasma
	Energy distribution
	PIC simulation
	Etching
ISSN	1346-7883
NCID	AA1147319X
Created Date	2019.11.29
Modified Date	2021.03.23