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Effect of Electron Thermal Motion on Inductively Coupled Plasma Production Using a Spiral Antenna

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Abstract The effect of the electron thermal motion on inductively coupled plasma (ICP) production by the use of a planar, spiral antenna was investigated experimentally. Results were compared to the calculated... ones by the non-local model based on the electron motion. Both of the measured skin depth of the evanescent wave and antenna-plasma loading resistance suggested a collisionless (collisional) heating mechanism in the low (high) collisionality for the ICP production. In addition, changing the boundary condition, Ar filling pressure and radio frequency (RF),the measured wave amplitude and the phase showed that the electron thermal motion plays more important role under the low collisionality.show more

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Created Date 2010.06.12
Modified Date 2020.11.02

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