作成者 |
|
|
|
|
|
本文言語 |
|
出版者 |
|
|
発行日 |
|
収録物名 |
|
巻 |
|
号 |
|
開始ページ |
|
終了ページ |
|
出版タイプ |
|
アクセス権 |
|
JaLC DOI |
|
関連DOI |
|
|
|
|
関連URI |
|
|
|
|
関連情報 |
|
|
|
|
概要 |
A uniform ECR plasma is produced with a multi slot antenna of 280mm in diameter. The radial profile of the ion saturation current density is examined as a function of microwave power and pressure. The... radial uniformity of the ion saturation current density is within pm3% over 8 inches in diameter for the input microwave power lkW at pressure of 2mTorr. Furthermore, the deposition of a-Si:H films is attempted on glass substrates using mixture SiH4/He. When the microwave power is increased, the thickness of the films increases.続きを見る
|