<departmental bulletin paper>
Investigation of 915 MHz ECR Plasma Parameters with SiH4/H2 Mixtures

Creator
Language
Publisher
Date
Source Title
Vol
Issue
First Page
Last Page
Publication Type
Access Rights
JaLC DOI
Related DOI
Related URI
Relation
Abstract Plasma parameters were measured successfully in a 915 MHz ECR plasma with H2 and SiH4/H2 mixtures using a heated Langmuir probe. The experimental results show that there is a correlation between elect...ron temperature and crystallinity of microcrystalline silicon. From the data analysis, it was found that there is a possibility that the electron temperature increased by production of negative ions promotes the crystallinity via some chemical reactions.show more

Hide fulltext details.

pdf p337 pdf 241 KB 273  

Details

Record ID
Peer-Reviewed
Subject Terms
ISSN
NCID
Created Date 2010.03.09
Modified Date 2020.12.08

People who viewed this item also viewed