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A Study for Thermal Development of PMMA after SR Exposure Using GPC

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Abstract Mask pattern image is engraved into polymethylmethacrylate (PMMA) film after SR light irradiation, and additional thermal treatment makes it deeper. PMMA molecular weight distribution was measured by ...using gel permeation chromatography (GPC) after each process. GPC measurement showed that PMMA molecular weight became lower after SR exposure, and lower PMMA molecules than M.W. 7,000 disappeared from the film thoroughly after thermal development at 135°C in vacuum. Comparing the density measured by microbalance with the refractive index by elipsometry, the change of molecular composition in PMMA might occur by SR irradiation.show more

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Created Date 2015.05.25
Modified Date 2020.11.27

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