作成者 |
|
|
本文言語 |
|
出版者 |
|
|
発行日 |
|
収録物名 |
|
巻 |
|
号 |
|
開始ページ |
|
終了ページ |
|
出版タイプ |
|
アクセス権 |
|
概要 |
The photochemical removal of formaldehyde (HCHO) was investigated in air (20 or 1% O_2) using a side-on type of 172 nm vacuum ultraviolet (VUV) Xe_2 excimer lamp at atmospheric pressure. Experiments w...ere carried out in a closed batch system and a flow system. HCHO was finally oxidized to CO_2 via HCHO, HCOOH, and CO intermediates at HCHO concentrations of 145 or 113 ppm. It was found that the initial O(3^P) + HCHO → OH + CHO reaction and the subsequent OH + HCHO → CHO + H_2O reaction play major roles in the initial stage of the decomposition of HCHO. At 1% O_2, direct VUV photolysis of HCHO and HCOOH also participates in the removal pathways of HCHO. The removal rate constant of HCHO at 1% O_2, 25.0 min-1, was 3.5 times larger than 7.2 min-1 at 20% O_2. When the HCHO removal was attempted using a flow system at a low HCHO concentration of 16 ppm, it was completely removed in the flow rate range of 1000-2000 ccm.続きを見る
|