<図書>
Fundamentals of modern VLSI devices
| 責任表示 | Yuan Taur, Tak H. Ning |
|---|---|
| データ種別 | 図書 |
| 版 | 2nd ed |
| 出版情報 | Cambridge, UK ; New York : Cambridge University Press , 2009 |
| 本文言語 | 英語 |
| 大きさ | xxiii, 656 p. : ill. ; 26 cm |
| 概要 | Taur (Electrical and Computer Engineering, University of California) and Ning (Fellow, IBM Thomas J. Watson Research Center) have updated this edition of their standard microelectronics text to reflec... the past decade's advances in VLSI devices. Readers are introduced to the basic properties and designs of VLSI devices, as well as factors that affect their performance. The text highlights the interdependencies and tradeoffs between important device parameters, and provides an in-depth discussion of device scaling and scaling limits of CMOS and bipolar devices. All chapters discuss recent developments in the field (such as MOSFET scale length theory, high-field transport, and SiGe-base bipolar devices), and new chapters deal with memory and silicon-on-insulator devices. The included equations and parameters are checked continuously against the reality of silicon data, making this text useful both for practical transistor design and for classroom use. Annotation ©2009 Book News, Inc., Portland, OR (booknews.com) 続きを見る |
所蔵情報
| 状態 | 巻次 | 所蔵場所 | 請求記号 | 刷年 | 文庫名称 | 資料番号 | コメント | 予約・取寄 | 複写申込 | 自動書庫 |
|---|---|---|---|---|---|---|---|---|---|---|
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: hbk | 理系図2F 開架 | 549.7/Ta 96 | 2009 |
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130012018802173 |
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書誌詳細
| 一般注記 | Includes bibliographical references (p. [623]-643) and index |
|---|---|
| 著者標目 | Taur, Yuan, 1946- Ning, Tak H., 1943- |
| 件 名 | LCSH:Metal oxide semiconductors, Complementary LCSH:Bipolar transistors LCSH:Integrated circuits -- Very large scale integration 全ての件名で検索 |
| 分 類 | LCC:TK7871.99.M44 DC22:621.39/5 |
| 書誌ID | 1001664827 |
| ISBN | 9780521832946 |
| NCID | BA9117798X |
| 巻冊次 | : hbk ; ISBN:9780521832946 |
| 登録日 | 2018.10.25 |
| 更新日 | 2018.10.25 |
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