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<図書>
Fundamentals of modern VLSI devices

責任表示 Yuan Taur, Tak H. Ning
データ種別 図書
2nd ed
出版情報 Cambridge, UK ; New York : Cambridge University Press , 2009
本文言語 英語
大きさ xxiii, 656 p. : ill. ; 26 cm
概要 Taur (Electrical and Computer Engineering, University of California) and Ning (Fellow, IBM Thomas J. Watson Research Center) have updated this edition of their standard microelectronics text to reflec... the past decade's advances in VLSI devices. Readers are introduced to the basic properties and designs of VLSI devices, as well as factors that affect their performance. The text highlights the interdependencies and tradeoffs between important device parameters, and provides an in-depth discussion of device scaling and scaling limits of CMOS and bipolar devices. All chapters discuss recent developments in the field (such as MOSFET scale length theory, high-field transport, and SiGe-base bipolar devices), and new chapters deal with memory and silicon-on-insulator devices. The included equations and parameters are checked continuously against the reality of silicon data, making this text useful both for practical transistor design and for classroom use. Annotation ©2009 Book News, Inc., Portland, OR (booknews.com) 続きを見る

所蔵情報


: hbk 理系図2F 開架 549.7/Ta 96 2009
130012018802173

書誌詳細

一般注記 Includes bibliographical references (p. [623]-643) and index
著者標目 Taur, Yuan, 1946-
Ning, Tak H., 1943-
件 名 LCSH:Metal oxide semiconductors, Complementary
LCSH:Bipolar transistors
LCSH:Integrated circuits -- Very large scale integration  全ての件名で検索
分 類 LCC:TK7871.99.M44
DC22:621.39/5
書誌ID 1001664827
ISBN 9780521832946
NCID BA9117798X
巻冊次 : hbk ; ISBN:9780521832946
登録日 2018.10.25
更新日 2018.10.25