<図書>
Handbook of advanced plasma processing techniques
責任表示 | R.J. Shul, S.J. Pearton (eds.) |
---|---|
シリーズ | Physics and astronomy online library |
データ種別 | 図書 |
出版情報 | Berlin : Springer , c2000 |
本文言語 | 英語 |
大きさ | xvi, 653 p. : ill. ; 25 cm |
概要 | This volume covers the topic of advanced plasma processing techniques, from the fundamental physics of plasmas to diagnostics, modeling and applications such as etching and deposition for microelectr...nics. The use of plasmas for patterning on a submicron scale has enabled successive generations of continually smaller transistors, lasers, micromachines, sensors and magnetic read/write heads that have formed the basis of our information age. This volume is the first to give coverage to this broad area of topics in a detailed fashion, especially in the rapidly expanding fields of micro-mechanical machines, photomask fabrication, magnetic data storage and reactor modeling. It provides the reader with a broad array of topics, authored by the leading experts in the field. 続きを見る |
所蔵情報
状態 | 巻次 | 所蔵場所 | 請求記号 | 刷年 | 文庫名称 | 資料番号 | コメント | 予約・取寄 | 複写申込 | 自動書庫 |
---|---|---|---|---|---|---|---|---|---|---|
|
|
理系図 自動書庫 | 427.6 | 2000 |
|
027212000002440 |
|
書誌詳細
一般注記 | Includes bibliographical references and index |
---|---|
著者標目 | Shul, Randy J. Pearton, S. J. |
書誌ID | 1001213681 |
ISBN | 3540667725 |
NCID | BA48324956 |
巻冊次 | ISBN:3540667725 |
登録日 | 2009.09.18 |
更新日 | 2009.09.18 |