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Handbook of chemical vapor deposition (CVD) : principles, technology, and applications
| Responsibility | by Hugh O. Pierson |
|---|---|
| Series | Materials science and process technology series |
| Material Type | Book |
| Publication | Park Ridge, N.J., U.S.A. : Noyes Publications , c1992 |
| Language | English |
| Size | xxii, 436 p. : ill. ; 25 cm |
| Abstract | A comprehensive overview of the principles, technology and application of chemical vapor deposition (CVD), an extremely versatile process which can be used to manufacture coatings, powders, fibers and...monolithic components. It presents a clear, objective, systematic assessment of CVD, including an examination of the theory of CVD processes, descriptions of the major CVD chemicals and chemical reactions, and reviews CVD systems and equipment used in industrial production and RandD, stressing key sub-processes such as plasma, laser, and photon CVD. Annotation copyright by Book News, Inc., Portland, ORshow more |
Holdings
| Status | Volume | Location | Call No. | Printed | Collection Name | Barcode No. | Comments | Reserve | Copy | Automatic archive |
|---|---|---|---|---|---|---|---|---|---|---|
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CHIKUSHI LIB., 1C, 460-599 | 566.7/P 62 | c1992 |
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072232000006318 |
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Bibliographic details
| Other titles | variant access title:Chemical vapor deposition |
|---|---|
| Notes | Includes bibliographical references and index |
| Authors | *Pierson, Hugh O. |
| Subjects | LCSH:Vapor-plating -- Handbooks, manuals, etc All Subject Search |
| Classification | LCC:TS695 DC20:671.7/35 |
| ID | 1001062660 |
| ISBN | 0815513003 |
| NCID | BA18879259 |
| Vol | ISBN:0815513003 ; PRICE:$68.00 |
| Created Date | 2009.09.17 |
| Modified Date | 2009.09.17 |